CDE ResMAP 178
Function
The CDE uses a 4-point probe to measure the sheet resistance. The automated stage enables measurement of the sheet resistance across the wafer.
Materials and Gasses
NA
Wafer Dimension
Samples accepted in range from 5 to 200 mm.
Temperature Range
Room Temperature only.
Contamination
Two dedicated tools, one for Non-contaminated wafers, and one for Contaminated samples.
Restrictions
NA
