Super AJA

Apparatus

  Sputter system

Supplier

    

AJA Int.

Location

 

P.00.370

Main purpose

 

Reactive sputtering of superconducting metals and alloys

System layout

  DC magnetron sputter guns (3 x 50 mm target) (angle adjustable)
DC magnetron sputter deposition (1x 75 mm target)
RF sputter etching

Power supply

 

600 W DC , 150 W DC, 150 W RF

Process information

 

(reactive) Sputtering of NbTiN, Ta, Nb, Ti

Facilities

  Sample rotation during deposition
Elevated sample temperature during deposition (750 C) 

Specimen

  max. 100mm wafer, small pieces allowed, max 1 mm thick

Equipment owner

 

Marinus Fischer
m.fischer@tudelft.nl
+31 628906207
Bas van Asten (back-up)
b.vanasten@tudelft.nl
+31 642481091