Super AJA
Apparatus | Sputter system | |
Supplier |
| AJA Int. |
Location | P.00.370 | |
Main purpose | Reactive sputtering of superconducting metals and alloys | |
System layout | DC magnetron sputter guns (3 x 50 mm target) (angle adjustable) DC magnetron sputter deposition (1x 75 mm target) RF sputter etching | |
Power supply | 600 W DC , 150 W DC, 150 W RF | |
Process information | (reactive) Sputtering of NbTiN, Ta, Nb, Ti | |
Facilities | Sample rotation during deposition Elevated sample temperature during deposition (750 C) | |
Specimen | max. 100mm wafer, small pieces allowed, max 1 mm thick | |
Equipment owner | Marinus Fischer |