Oxford ALD

Apparatus

    

Flexal

Supplier

 

Oxford instruments www.oxinst.com

Location

 

P.00.350

Function

 

Atomic Layer Deposition of very thin, extremely uniform layers

Gasses

 

SF6, H2, NH3, O2 and N2.

RF sources

 

ICP source for plasma assisted ALD

Cooling system

 

Table heater 200C-4000C

System layout

 

Main chamber and Loadlock with separate pumping

Chuck

 

Metal chuck, no clamping

Process information

 

Thermal and plasma assisted ALD of Al2O3  and HfO2

Max. precursor temperature 2000C

 

Facilities

 

Spectroscopic ellipsometer optional

Specimen

 

Max. 100mm)wafers, small pieces allowed.

Equipment owner

 

Bas van Asten

b.vanasten@tudelft.nl

+31 642481091

 

Marinus Fischer (back-up)

m.fischer@tudelft.nl

+31 628906207