Oxford ALD
Apparatus |
| Flexal |
Supplier | Oxford instruments www.oxinst.com | |
Location | P.00.350 | |
Function | Atomic Layer Deposition of very thin, extremely uniform layers | |
Gasses | SF6, H2, NH3, O2 and N2. | |
RF sources | ICP source for plasma assisted ALD | |
Cooling system | Table heater 200C-4000C | |
System layout | Main chamber and Loadlock with separate pumping | |
Chuck | Metal chuck, no clamping | |
Process information | Thermal and plasma assisted ALD of Al2O3 and HfO2 Max. precursor temperature 2000C
| |
Facilities | Spectroscopic ellipsometer optional | |
Specimen | Max. 100mm)wafers, small pieces allowed. | |
Equipment owner | Bas van Asten +31 642481091
Marinus Fischer (back-up) +31 628906207 | |