Leybold L560

Apparatus

L560 evaporation system

Supplier

Leybold Heraeus

Location

P00.330

Main purpose

Evaporation

System layout

evaporation by e-beam heating (4x 4cc crucible liners)

evaporation by  resistive heating

Power supply

12kV HV for e-beam and 5V/800A AC for resistive heating

Process information

a wide range of materials can be deposited, due to the absence of a loadlock, for example: Al2O3, C, SiO2, TiO2, Ag, Al, Au, AuPd, AuGe, Bi, Cr, In, Mo, Ni, NiCr, NiFe, Nb, Pd, Pt, PtPd, Ru, Si, Ti, Ta, V, W, Zr

Facilities

reactive evaporation (with low O2 or N2 pressure)

Specimen

max. 100mm wafers, small pieces allowed

Equipment Owner:

Marinus Fischer

m.fischer@tudelft.nl

+31 628906207


Bas van Asten (back-up)

b.vanasten@tudelft.nl

+31 642481091