Leica EM ACE600

Apparatus

     

Leica EM ACE600 high vacuum sputter coater

Supplier

 

Leica, www.leica-microsystems.com

Location

 

P00.550

Main purpose

 

Coating samples with thin conductive films for SEM and TEM analysis

System layout

 

DC and RF magnetron sputter deposition (4x 4 inch target)

RF sputter etching

 

Gasses

 

Ar

Process information

 

Gold, Chromium, Platinum and gold/palladium.

very fast, depositing a 10nm layer takes less than 10min including pumping and venting time.

 

Facilities

 

Vacuum chamber, touch screen control panel, rotating sample stage, quartz (QSG) thickness measurement  and sputter source.

Specimen

 

max. 100mm wafers, small pieces allowed

Equipment owner

  Hozan Miro
h.miro@tudelft.nl

+31 650559998

Marco van der Krogt (back-up)
m.c.vanderkrogt@tudelft.nl
+31 650559999