Wet Etching line
Function
The Wet Etching line is a series of pre-made chemical baths employed for the wet chemical etching of semiconductors (poly-Si), dielectrics (SiO2, SixNy), metals (Al, Ti, Mo, ...) and organics (photoresist). TritonX baths are closer to every etching bath to increase the wettability of the surface and make the wet etching more unifrom.
Chemical baths
HF 0.55%; BHF 7:1; Technietch Al80, Silicon Nitride etchant, PES, Acetone, H2O.
Wafer Dimension
Only 4 inch wafers are allowed. Up to 25 wafers can be loaded for etching on one go.
Temperature Range
NA.
Contamination
Only non-Contaminated samples are allowed.
Restrictions
Two different chemical baths are prepared for processing with green metals and bare silicon wafers in order to reduce metal cross contamination.
