Wet Cleaning line
Function
The Wet Cleaning line is a series of pre-made chemical baths employed for the wet chemical cleaning of silicon wafers after photoresist ashing. These baths are employed to reduce\remove the organics and the metal contaminations from silicon wafers, making them ready to be processed.
Chemical baths
HNO3 99%; HNO3 69%; HCl, H2O
Wafer Dimension
Only 4 inch wafers are allowed. Up to 25 wafers can be loaded for cleaning on one go.
Temperature Range
NA.
Contamination
Only non-Contaminated samples are allowed.
Restrictions
Two different chemical baths are prepared for processing with green metals and bare silicon wafers in order to reduce metal cross contamination.
