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Here are reported all the tools employable at Else Kooi Laboratory for Lithography. If you have concerns or questions about any tool you can…

Most people like to keep both mathematics and epidemics at a distance. But a little bit of the former can do wonders in limiting the latter.…

How can you ensure that a computer understands exactly what someone is saying even if they cannot speak the language perfectly? In her quest…

Call for proposals on AI-Augmented Engineering Education As AI is radically changing the design, engineering and science processes, the…

Function The Trikon Sigma 200 is a sputtering machine. It can be used for sputter deposition of metals ( Al, AlSi1%, Cr, Cu, Mo, Ni, Ti, Zr…

Function The CHA Solution is used for e-beam evaporation. The materials that are currently available for evaporation are: Al, Al2O3, Au, Co,…

Function PlasmaLab 100 is an Inductively Coupled - Plasma Enhanced Chemical Vapor Deposition ( ICP-PECVD ), which is used for thin film…

Function The Parylene Deposition System 2 is a Chemical Vapor Deposition ( CVD ) machine that allows the uniform deposition of Parylene C, a…

Function The Diener Atto Plasma Reactor is a low power (max 200W) Oxygen plasma reactor employed for surface activation. The low power…

Function The PVA Tepla GigaBatch 360M is a plasma asher used to remove photoresist from wafers before wet chemical cleaning. It employs a…