Parylene Deposition System 2
Function
The Parylene Deposition System 2 is a Chemical Vapor Deposition (CVD) machine that allows the uniform deposition of Parylene C, a biocompatible material. It works with the vaporization of Parylene C dimers, that will coat the samples and the chamber, with a monolayer of this polymer.
Materials and Gasses
- Parylene C
Substrate Dimension
In the tool are allowed wafers up to 6 inches, dies, small PCBs and electronic circuitry.
Temperature Range
The chamber is at room temperature.
Contamination
Contaminated tool. Any sample introduced in this machine will be considered contaminated.
Remarks
System pumps down to 15 mTorr during process.
Max 10 g of Parylene C dimer in one coating cycle, ~5 µm of uniform layer.
Up to 4 substrates can be coated in one deposition cycle.
