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Function PlasmaLab 100 is an Inductively Coupled - Plasma Enhanced Chemical Vapor Deposition ( ICP-PECVD ), which is used for thin film…

Function The Parylene Deposition System 2 is a Chemical Vapor Deposition ( CVD ) machine that allows the uniform deposition of Parylene C, a…

Function The Diener Atto Plasma Reactor is a low power (max 200W) Oxygen plasma reactor employed for surface activation. The low power…

Function The PVA Tepla GigaBatch 360M is a plasma asher used to remove photoresist from wafers before wet chemical cleaning. It employs a…

Function The PVA Tepla 300 is a plasma asher used to remove photoresist from wafers before wet chemical cleaning. It employs a frequency of…

Here are reported all the tools employable at Else Kooi Laboratory for Packaging & Assembly. If you have concerns or questions about any…

A vision of the future: a completely wireless world, in the fields of both communications and energy.

What role does copyright play in your own publications, in teaching situations or when reusing other people's publications? Find your…