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Function The CHA Solution is used for e-beam evaporation. The materials that are currently available for evaporation are: Al, Al2O3, Au, Co,…

/en/eemcs/research/facilities/else-kooi-lab/equipment/film-formation/cha-solution

Function PlasmaLab 100 is an Inductively Coupled - Plasma Enhanced Chemical Vapor Deposition ( ICP-PECVD ), which is used for thin film…

/en/eemcs/research/facilities/else-kooi-lab/equipment/film-formation/oxford-plasmapro100

Function The Parylene Deposition System 2 is a Chemical Vapor Deposition ( CVD ) machine that allows the uniform deposition of Parylene C, a…

/en/eemcs/research/facilities/else-kooi-lab/equipment/film-formation/parylene-deposition-system-2

Function The Diener Atto Plasma Reactor is a low power (max 200W) Oxygen plasma reactor employed for surface activation. The low power…

/en/eemcs/research/facilities/else-kooi-lab/equipment/polymer-processing/diener-atto-plasma-reactor

Function The PVA Tepla GigaBatch 360M is a plasma asher used to remove photoresist from wafers before wet chemical cleaning. It employs a…

/en/eemcs/research/facilities/else-kooi-lab/equipment/dry-etching/pva-tepla-360m

Function The PVA Tepla 300 is a plasma asher used to remove photoresist from wafers before wet chemical cleaning. It employs a frequency of…

/en/eemcs/research/facilities/else-kooi-lab/equipment/dry-etching/pva-tepla-300

A vision of the future: a completely wireless world, in the fields of both communications and energy.

/en/eemcs/current/science-stories/stories/trailblazers-of-the-wireless-revolution

What role does copyright play in your own publications, in teaching situations or when reusing other people's publications? Find your…

/en/library/support/copyright

Here are reported all the other tools employable at Else Kooi Laboratory . More information, and news will be posted on NIS System . Avenger…

/en/eemcs/research/facilities/else-kooi-lab/equipment/others

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