SSI

Apparatus

    

Rapid Thermal Annealer (RTA)

Supplier

 

Solaris

Location

 

P.00.350

Function

 

Heat treatment of Silicon substrates

System Specifications

 

Halogen lamps heated chamber. N2, Ar and forming gas (N2/10%H2) available. Max. ramp: 1000C/ second

Chuck

 

100mm quartz wafer holder

Specimen

 

Max. 100mm wafers, small pieces allowed

Responsible person

 

 

 

+31 6

 

Charles de Boer (back-up)

c.r.deboer@tudelft.nl

+31 652169001