SSI
Apparatus |
| Rapid Thermal Annealer (RTA) |
Supplier | Solaris | |
Location | P.00.350 | |
Function | Heat treatment of Silicon substrates | |
System Specifications | Halogen lamps heated chamber. N2, Ar and forming gas (N2/10%H2) available. Max. ramp: 1000C/ second | |
Chuck | 100mm quartz wafer holder | |
Specimen | Max. 100mm wafers, small pieces allowed | |
Responsible person |
+31 6
Charles de Boer (back-up) +31 652169001 |