Raith EBPG-5000+

Main characteristics

Acceleration voltage

20, 50 or 100 kV

Beam current

100 pA … 300 nA

Spot size

≈2 … >350 nm (defocussed)

Main field resolution

0.16 … 1.0 nm

Main field size

160 (167.77216) … 1000 (1048.576) µm (20 bit)

Subfield resolution

0.08 … 0.5 nm

Subfield size

1.31072 … 4.525 µm (14 bit, 100 kV)

Beam step size

0.08 … 4096 nm

Beam step frequency

500 Hz … 125 MHz

Max pattern size

150 x 150 mm

Interferometer resolution

0.618 nm (λ/1024)

In field distortion

< 20 nm (mean + 3s)

Stitching

< 40 nm (mean + 3s)

Alignment

< 30 nm (mean + 3s)

Operating system

Red Hat Enterprise Linux

Substrates

Wafers

2, 3 and 4 inch

Mask plates

4 and 5 inch

Rectangular wafer pieces

5 x 5 … 19 x 40 mm

Irregular wafer pieces

Max. of 4 inch wafer

Pattern converter

Programm

BEAMER

Supplier

GenISys GmbH

Input formats

a.o. GDSII, DXF, CIF, TeXtLib

Option

Proximity Effect Correction

Apparatus

EBPG5000Plus HS 100

Supplier

 Raith, www.raith.com

Purpose

High resolution electron beam exposure

Contact Arnold van Run
+31 650965160
a.j.vanrun@tudelft.nl

Anja van Langen (back up)
+31 650836333
A.K.vanLangen-Suurling@tudelft.nl