Heidelberg Instruments Laserwriter
Apparatus | Laserwriter |
Supplier | Heidelberg Instruments |
Apparatus type | μMLA |
Function | Optical Laser Direct Write |
Main Purpose | Maskless Photo Lithography |
Main Characteristics | 1μm laser beam @365nm raster scan, minimum structure size 1μm, minimum lines and spaces (half pitch) 1.5 μm, 2nd layer alignment (3σ) 1μm |
Facilities | Automatic front-side alignment |
Typical Application | Alignment and exposure of photoresist |
| Specimen | minimum substrate size 5mm x 5mm, maximum substrate size 5" x 5" , substrate thickness 0.1 to 12mm maximum write area 100mm x 100mm |
Equipment Owner | Anja van Langen
Charles de Boer (back-up) |