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Function The Wet Etching line is a series of pre-made chemical baths employed for the wet chemical etching of semiconductors (poly-Si),…

Function The Hitachi Regulus 8230 is a Scanning Electron Microscope (SEM). The SEM is used for imaging samples with electrons. The…

Function The SPTS Vapor HF is used to etch oxides layers, usually employed as sacrificial layers, to release structures via dry vapor…

Function The Avenger Rinser Dryer is a tool employed for drying the wafers after being wet chemically processed and rinsed in a water baths.…

Function The Woollam ellipsometer is used for measuring the thickness of transparent layers. Ellipsometry particularly useful to measure the…

Function The Eichhorn measures the wafer thickness, bow and warp on fixed places using capacitive sensors. It can be used for wafers in the…

Function The CDE uses a 4-point probe to measure the sheet resistance. The automated stage enables measurement of the sheet resistance…

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Function The Trikon Sigma 200 is a sputtering machine. It can be used for sputter deposition of metals ( Al, AlSi1%, Cr, Cu, Mo, Ni, Ti, Zr…

Function The CHA Solution is used for e-beam evaporation. The materials that are currently available for evaporation are: Al, Al2O3, Au, Co,…