Pro2Tech Lecture | Past, present and future of atomic layer deposition for catalysis: perspective from Aalto University, Finland

Aalto University is the alma mater of the Finnish inventor of atomic layer deposition (ALD) Tuomo Suntola, who patented ALD in 1974 and received Millennium Technology Prize for his pioneering work in 2018. Research for ALD on catalysis in Finland started at Microchemistry and at Neste company in late 1980s, and already in the 1990s, research was active at Aalto University’s predecessor, Helsinki University of Technology. Since those days, ALD has become a mainstream technology in the semiconductor industry, and the interest for ALD on particulate matter for catalysis and other applications has become global. In addition to history, I will in the talk share recent examples of ALD for catalysis from Aalto University, and discuss future research needs and opportunities. The talk partly builds upon review activities of ALD on particulate matter, being carried out collaboration between researchers from TU Delft and Aalto University.