Omar El Gawhary
Research Interest: Optical metrology and superresolution, Nanometrology by optical methods, superresolution, computational optics, topological information and its application in scattering problems.
Academic Background:
Laureaa degree in Electronics Engineering (Quantum Electronics) from “La Sapienza” University in Rome (Italy) (110/110 cum laude) (2000).
Industrial experience from 2000 until 2007 (telecom sector as well as public Institutions, Italy).
PhD in Physics (Optics, 2003-2007), from Roma Tre University in Rome (2007).
From 2008 to 2012 Post doctoral position at the Optics group of TU Delft. Research performed in strict collaboration with ASML.
From 2011-2020 principal scientist at VSL, the National Metrology Institute of the Netherlands (situated in Delft). Responsible of the absolute radiometry lab and initiator of optical nanometrology research lab at VSL (single wavelelength and hyperspectral optical scatterometry, ptychography etc.).
From 2020: Principal scientist at ASML Research.
From Sep 2017 – part-time Associate Professor at Delft University of Technology, ImPhys Depart, Optics Group.
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2024
Born-Padé method for scattering by a diffraction grating
s polarization
Thomas A. van der Sijs / Omar El Gawhary / H. Paul Urbach -
2024
Cause of inaccuracies in the Padé approximant of the Born series for strong electromagnetic scattering problems
J.B.P. de Graaff / T.A. van der Sijs / H.P. Urbach / O. El Gawhary
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2024
Padé approximants of the Born series of electromagnetic scattering by a diffraction grating
T.A. van der Sijs / O. El Gawhary / H.P. Urbach
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2022
Diffraction grating parameter retrieval using non-paraxial structured beams in coherent Fourier scatterometry
S. Soman / S. F. Pereira / O. El Gawhary
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2020
Electromagnetic scattering beyond the weak regime: Solving the problem of divergent Born perturbation series by Padé approximants
T.A. van der Sijs / O. El Gawhary / H.P. Urbach
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