Publications

• 2024

  Broadband, High-Reflectivity Dielectric Mirrors at Wafer Scale

  Combining Photonic Crystal and Metasurface Architectures for Advanced Lightsails
  Jin Chang / Wenye Ji / Xiong Yao / Arnold J. van Run / Simon Gröblacher

• 2008

  Towards 2-10 nm electron-beam lithography: a quantitative approach

  VA Sidorkin / AJ van Run / AK van Langen-Suurling / AE Grigorescu / EWJM van der Drift

• 2000

  Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

  AJ van Dodewaard / WSM Ketelaars / RFM Roes / JAJ Kwinten / FCMJM van Delft / AJ van Run / AK Suurling

• 1999

  Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

  AJ van Dodewaard / WSM Ketelaars / RFM Roes / JAJ Kwinten / FCMJM van Delft / AJ van Run / J Romijn / AK Suurling

• More publications