AR-N-7520
Tone | Negative | |
Reference | All resist: https://www.allresist.com/portfolio-item/e-beam-resist-ar-n-7520-new-series/ | |
Spin coat |
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Bake | hotplate in oven at 85°C for 1 minute | |
Exposure | dose 500µC/cm² | |
Development | MF322 for 60s (hold wafer vertical during development!!) | |
Rinse | MF322: H2O= 1:10 for 15s, MF322: H2O= 1:10 for 15s (fresh bath) H2O for 15s H2O for 15s (fresh bath |
