Rarefied gas flow in Physical Vapor Deposition
Research goal
Physical Vapor Deposition (PVD) processes are traditionally used at a small scale and for batch processes. For the upscaling to a continuous process it is necessary to use multiple vapor jets (see fig.1) with a high mass flow rate. The project aims at understanding the physics of the metal vapor transport towards the surface. There are three major aims in this project: First the development of a hybrid solver coupling Computational Fluid Dynamics (CFD) and Direct Simulation Monte Carlo (DSMC). Secondly, understanding the physics in continuous a PVD line, especially interacting jets (see fig. 2). Eventually, using the obtained knowledge for process optimization.
Researcher
Elin Vesper
Funded by
FOM
Tata Steel