Tempress Furnaces - Oxidation
Function
The Tempress Oxidation Furnaces are atmospheric tubes for oxide growth, annealing and alloying of wafers. This tool allows the wet or dry oxide growth, annealing and alloying in N2, Ar and forming gas (H2 + N2 mixture).
Materials and Gasses
- N2, Ar, O2, H2, H2O
Wafer Dimension
The tubes dimension allows 4 to 6 inches (100-150 mm) wafers for the deposition. Smaller samples are allowed on top of a carrier wafer.
Temperature Range
The tubes can work in temperature ranges between 250C and 1050C.
Contamination
Semi-Clean tool. 4 Tubes are present in the oxidation stack. According to your contamination level the correct tube has be chosen.
- Ultraclean
- Clean
- Green Metal contaminated
- Red Metal contaminated
Restrictions
NA
