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E.K. (Eftychia) Kalogianni
J.W. Millecam
T.W.C. Vroegrijk
- +31 15 27 88267
- T.W.C.Vroegrijk@tudelft.nl
- 36.HB 06.280
A. (Aditya) Shekhar
- +31 15 27 85744
- A.Shekhar@tudelft.nl
- 36.LB 03.680
B. Torun
G.A. van der Hoorn
- +31 15 27 88643
- G.A.vanderHoorn@tudelft.nl
- 34.F-1-700
EVG 120
Function The EVG120 is an automatic coater-developer track. It has two tracks. One track is for coating wafers with photoresist, while the…
/en/eemcs/research/facilities/else-kooi-lab/equipment/lithography/evg120
ASML Stepper PAS5500/80
Function The PAS 5500/80 stepper provides automatic alignment and exposure of photoresist films. It exposes one die at a time with i-line or…
/en/eemcs/research/facilities/else-kooi-lab/equipment/lithography/asml-stepper
K.P. (Klaas) van der Tempel
V.E. Balz
- +31 15 27 87923
- V.E.Balz@tudelft.nl
- 08.BG.West.110